Metal silicide patterning: A new approach to silicon nanoelectronics

Nanotechnology

Volumn 7, Issue 3, 1996, Pages 275-287

  Tucker, J R ^a   Wang, C ^a   Shen, T C ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC EQUIPMENT MANUFACTURE; INTEGRATED CIRCUITS; LITHOGRAPHY; SEMICONDUCTING SILICON;

METAL SILICIDE; SILICON NANOELECTRONICS;

NANOTECHNOLOGY;

EID: 0030231382     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/7/3/018     Document Type: Article

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