The initial stage of nucleation and growth of Al on H/Si(100)-1×1 by dimethylaluminum hydride vapor deposition

Applied Surface Science

Volumn 141, Issue 3-4, 1999, Pages 228-236

  Shen, T C ^a   Wang, C ^b   Tucker, J R ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

61.16.Ch; 68.35.Bs; 81.15 Gh; 81.65 Cf; 85.40.Ux; AJ; Aluminum; CKD; Dimethylaluminum hydride; HF; Hydrogen; SBA; Scanning tunnelling microscopy; Silicon; Surface morphology

Indexed keywords

EID: 0001699877     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00509-1     Document Type: Article

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