Atomic-level robustness of the Si(100)-2×1: H surface following liquid phase chemical treatments in atmospheric pressure environments

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 3, 2004, Pages

  Baluch, A S ^a   Guisinger, N P ^a   Basu, R ^a   Foley, E T ^a   Hersam, M C ^a  

^a Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL PROCESSING; CHEMICAL TREATMENTS; FEEDBACK-CONTROLLED LITHOGRAPHY (FCL); LIQUID PHASES;

ATMOSPHERIC PRESSURE; DEGRADATION; MICROELECTRONICS; MOLECULAR BEAM EPITAXY; MOLECULAR WEIGHT; NANOTECHNOLOGY; PASSIVATION; SCANNING TUNNELING MICROSCOPY; SILICON; SOLVENTS; SURFACE CHEMISTRY; SURFACE ROUGHNESS; WATER TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC PHYSICS;

EID: 3142596399     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1722203     Document Type: Article

References (30)

1. M. K. Weldon, K. T. Queeney, J. Eng., Jr., Krishnan Raghavachari, and Y. J. Chabal, Surf. Sci. 500, 859 (2002).
2. M. C. Hersam, N. P. Guisinger, and J. W. Lyding, J. Vac. Sci. Technol. A 18, 1349 (2000).
3. M. C. Hersam, N. P. Guisinger, and J. W. Lyding, Nanotechnology 11, 70 (2000).
4. G. P. Lopinski, D. D. Wayner, and R. A. Wolkow, Nature (London) 406, 48 (2000).
5. W. A. Hofer, A. J. Fisher, G. P. Lopinski, and R. A. Wolkow, Chem. Phys. Lett. 365, 129 (2002).
6. P. Kruse, E. R. Johnson, G. A. DiLabio, and R. A. Wolkow, Nano Lett. 2, 807 (2002).
7. M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami, and K. Suma, Appl. Phys. Lett. 55, 562 (1989).
8. M. Morita, T. Ohmi, E. Hasegawa, M. Kawakami, and M. Ohwada, J. Appl. Phys. 68, 1272 (1990).
9. H. Bender, S. Verhaverbeke, and M. M. Heyns, J. Electrochem. Soc. 141, 3128 (1994).
10. S.-L. Yan, K. Kaji, and K. Itaya, Appl. Phys. Lett. 66, 766 (1995).
11. Y. Morita and H. Tokumoto, J. Vac. Sci. Technol. A 14, 854 (1996).
12. K. Endo, K. Arima, T. Kataoka, Y. Oshikane, H. Inoue, and Y. Mori, Appl. Phys. Lett. 73, 1853 (1998).
13. K. Endo, K. Arima, K. Hirose, T. Kataoka, and Y. Mori, J. Appl. Phys. 91, 4065 (2002).
14. M. C. Hersam, N. P. Guisinger, and J. W. Lyding, Appl. Phys. Lett. 78, 886 (2001).
15. Vacuum Atmospheres Company, #CPU-021695, Hawthorne, CA 90250.
16. J. J. Boland, Surf. Sci. 261, 17 (1992).
17. M. Niwano, J. Kageyama, K. Kurita, K. Kinashi, I. Takahashi, and N. Miyamoto, J. Appl. Phys. 75, 2157 (1994).
18. T. Miura, M. Niwano, D. Shoji, N. Nobuo, and N. Miyamoto, J. Appl. Phys. 79, 4373 (1996).
19. X. Zhang, E. Garfunkel, Y. J. Chabal, S. B. Christman, and E. E. Chaban, Appl. Phys. Lett. 79, 4051 (2001).
20. R. S. Becker, G. S. Higashi, Y. J. Chabal, and A. J. Becker, Phys. Rev. Lett. 65, 1917 (1990).
21. H. Sakaue, S. Fujiwara, S. Shingubara, and T. Takahagi, Appl. Phys. Lett. 78, 309 (2001).
22. Y. Terada, B. Choi, S. Heike, M. Fujimori, and T. Hashizume, Jpn. J. Appl. Phys. 42, 4739 (2003).
23. CRC Handbook of Chemistry and Physics, 79th ed., edited by D. R. Lide (CRC Press, Boca Raton, 1999), pp. 9-51.
24. C. P. Wade and C. E. D. Chidsey, Appl. Phys. Lett. 71, 1679 (1997).
25. S. P. Garcia, H. Bao, M. Manimaran, and M. A. Hines, J. Phys. Chem. B 106, 8258 (2002).
26. J. W. Lyding, T.-C. Shen, J. S. Hubacek, J. R. Tucker, and G. C. Abeln, Appl. Phys. Lett. 64, 2010 (1994).
27. D. Graf, M. Grundner, and R. Schulz, J. Vac. Sci. Technol. A 7, 808 (1989).
28. E. P. Boonekamp, J. J. Kelly, J. van de Ven, and A. M. Sondag, J. Appl. Phys. 75, 8121 (1994).
29. H. Ogawa, K. Ishikawa, C. Inomata, and S. Fujimura, J. Appl. Phys. 79, 472 (1996).
30. G. W. Trucks, K. Raghavachari, G. S. Higashi, and Y. J. Chabal, Phys. Rev. Lett. 65, 504 (1990).