Room temperature nanofabrication of atomically registered heteromolecular organosilicon nanostructures using multistep feedback controlled lithography

Applied Physics Letters

Volumn 85, Issue 13, 2004, Pages 2619-2621

  Basu, R ^a   Guisinger, N P ^a   Greene, M E ^a   Hersam, M C ^a  

^a Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COVALENT BONDS; FEEDBACK CONTROLLED LITHOGRAPHY (FCL); HETEROMOLECULAR ORGANOSILICON NANOSTRUCTURES; PATTERNED DANGLING BONDS;

ARSENIC; CHEMICAL BONDS; DESORPTION; DOPING (ADDITIVES); ELECTRON BEAMS; ELECTRONIC STRUCTURE; LITHOGRAPHY; MOLECULAR STRUCTURE; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR MATERIALS; SILICON; STYRENE; THERMAL DIFFUSION; ULTRAHIGH VACUUM;

NANOSTRUCTURED MATERIALS;

EID: 7544234468     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1802384     Document Type: Article

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