Bromine functionalized molecular adlayers on hydrogen passivated silicon surfaces

Chemical Physics

Volumn 326, Issue 1, 2006, Pages 144-150

  Basu, R ^a   Kinser, C R ^a   Tovar, J D ^a   Hersam, M C ^a  

^a Northwestern University   (United States)

Author keywords

4 Bromostyrene; Bromine; Hydrogen; Molecular electronics; Passivation; Scanning tunneling microscopy; Sensing; Si(1 0 0); Si(1 1 1); Silicon; STM; Styrene; UHV; Ultra high vacuum; X ray photoelectron spectroscopy; XPS

Indexed keywords

EID: 33745501203     PISSN: 03010104     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.chemphys.2005.12.023     Document Type: Article

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