Island structure evolution during chemical vapor deposition

Surface Science

Volumn 371, Issue 2-3, 1997, Pages 445-454

  Adams, D P ^a   Mayer, T M ^a   Chason, E ^a   Kellerman, B K ^a   Swartzentruber, B S ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

Chemical vapor deposition; Growth; Iron; Nucleation; Scanning tunneling microscopy; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; IRON; MONTE CARLO METHODS; NUCLEATION; PYROLYSIS; REACTION KINETICS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SURFACE STRUCTURE; THERMAL EFFECTS;

DIFFERENTIAL REACTION PROBABILITY;

METALLIC FILMS;

EID: 0031077492     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01005-9     Document Type: Article

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