메뉴 건너뛰기




Volumn 412-413, Issue , 1998, Pages 509-517

Diffusion, nucleation and annealing of Co on the H-passivated Si(100) surface

Author keywords

Growth; Nucleation; Scanning tunneling microscopy; Surface relaxation and reconstruction

Indexed keywords

ANNEALING; DEPOSITION; DESORPTION; DIFFUSION IN SOLIDS; HYDROGEN; NUCLEATION; PASSIVATION; RELAXATION PROCESSES; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE TREATMENT;

EID: 0032165994     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(98)00481-6     Document Type: Article
Times cited : (23)

References (47)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.