Low energy electron beam stimulated surface reaction: Selective etching of SiO2/Si using scanning tunneling microscope

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 37, Issue 8 SUPPL. B, 1998, Pages

  Li, Nan ^a   Yoshinobu, Tatsuo ^a   Iwasaki, Hiroshi ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Low energy electron beam; Nanofabrication; Selective etching; SiO2; STM

Indexed keywords

ELECTRON BEAMS; ETCHING; NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SILICA; SURFACE CHEMISTRY; SURFACE STRUCTURE;

LOW ENERGY ELECTRON BEAM STIMULATED SURFACE REACTION (LEESR);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032131288     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.l995     Document Type: Article

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