Reactive sputter deposition of TiN layers: Modelling the growth by characterization of particle fluxes towards the substrate

Journal of Physics D: Applied Physics

Volumn 42, Issue 5, 2009, Pages

  Mahieu, S ^a   Depla, D ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

LEAD; METALLIC FILMS; MICROSTRUCTURE; SPUTTER DEPOSITION; SUBSTRATES; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

ENERGY FLUXES; EXTENDED STRUCTURES; PARTICLE FLUXES; REACTIVE SPUTTER DEPOSITIONS; TIN FILMS; TIN LAYERS;

TIN;

EID: 63649164133     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/5/053002     Document Type: Article

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