Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN

Surface and Coatings Technology

Volumn 202, Issue 11, 2008, Pages 2314-2318

  Mahieu, S ^a   Depla, D ^a   Gryse, R De ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Energy flux; Hardness; Ion flux; Momentun flux; Reactive magnetron sputtering; TiN

Indexed keywords

CHARACTERIZATION; CRYSTALLOGRAPHY; HARDNESS; MICROSTRUCTURE; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TITANIUM NITRIDE;

ENERGY FLUX; ION FLUX; MOMENTUM FLUX; REACTIVE MAGNETRON SPUTTERING; SUBSTRATES FLUXES;

MAGNETRON SPUTTERING;

CHARACTERIZATION; CRYSTALLOGRAPHY; HARDNESS; MAGNETRON SPUTTERING; MICROSTRUCTURE; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TITANIUM NITRIDE;

EID: 38949108671     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.09.002     Document Type: Article

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