Control of plasma flux composition incident on TiN films during reactive magnetron sputtering and the effect on film microstructure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 1, 2006, Pages 25-29

  Muratore, C ^a,b   Walton, S G ^a   Leonhardt, D ^a   Fernsler, R F ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b AIR FORCE RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION EXPERIMENTS; ION FLUX; PLASMA FLUX COMPOSITION;

ATOMIC FORCE MICROSCOPY; CRYSTALLOGRAPHY; MAGNETRON SPUTTERING; MICROSTRUCTURE; PLASMA APPLICATIONS; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

TITANIUM COMPOUNDS;

EID: 29344438918     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2134706     Document Type: Article

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