Ion beam assisted deposition of TiN thin film on Si (100)

Materials Chemistry and Physics

Volumn 59, Issue 1, 1999, Pages 49-56

  Huang, J H ^a   Lin, C H ^a   Chen, Haydn ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; EVAPORATION; FILM PREPARATION; ION SOURCES; SEMICONDUCTING SILICON; SEMICONDUCTING TIN COMPOUNDS; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM EVAPORATION SOURCE; ION BEAM ASSISTED DEPOSITION (IBAD);

ION BEAM LITHOGRAPHY;

EID: 0032665645     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(99)00023-1     Document Type: Article

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