Dependence of the sticking coefficient of sputtered atoms on the target-substrate distance

Journal of Physics D: Applied Physics

Volumn 41, Issue 15, 2008, Pages

  Mahieu, S ^a,c   Van Aeken, K ^a   Depla, D ^a   Smeets, D ^b   Vantomme, A ^b  

^a GHENT UNIVERSITY   (Belgium)

^b KU LEUVEN   (Belgium)

^c RESEARCH FOUNDATION FLANDERS FWO   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

PLANAR MAGNETRON; SPUTTERED ATOMS; STICKING COEFFICIENTS; TARGET-SUBSTRATE DISTANCE;

SPUTTERING;

EID: 49749137882     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/15/152005     Document Type: Article

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