Overall energy model for preferred growth of TiN films during filtered arc deposition

Journal of Physics D: Applied Physics

Volumn 30, Issue 1, 1997, Pages 5-12

  Zhao, J P ^a   Wang, X ^a   Chen, Z Y ^a   Yang, S Q ^a   Shi, T S ^a   Liu, X H ^a  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; FILMS; INTERFACIAL ENERGY; MATHEMATICAL MODELS; SUBSTRATES; THICKNESS CONTROL;

ENERGETIC PARTICLES; FILTERED ARC DEPOSITION; OVERALL ENERGY MODEL; STOPPING ENERGY; STRAIN ENERGY; SUBSTRATE BIAS;

TITANIUM NITRIDE;

EID: 0031556912     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/1/002     Document Type: Article

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