Optical properties of TiN films deposited by direct current reactive sputtering

Journal of Applied Physics

Volumn 87, Issue 3, 2000, Pages 1264-1269

  Adachi, Sadao ^a   Takahashi, Mitsutoshi ^b  

^a GUNMA UNIVERSITY   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001119338     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372006     Document Type: Article

References (35)

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