메뉴 건너뛰기




Volumn 95, Issue 1, 2004, Pages 356-362

Growth, surface morphology, and electrical resistivity of fully strained substoichiometric epitaxial TiNx (0.67 ≤ x < 1.0) layers on MgO(001)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNESIA; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; PHYSICAL PROPERTIES; STOICHIOMETRY; SURFACES; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

EID: 0942288926     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1629155     Document Type: Article
Times cited : (124)

References (37)
  • 34
    • 11744309036 scopus 로고    scopus 로고
    • Sputter deposition, typically, results in a cosine distribution of the incoming atom flux with the highest flux at an azimuthal angle of 45°; H. Huang, G. H. Gilmer, and T. D. de la Rubia, J. Appl. Phys. 84, 3636 (1998).
    • (1998) J. Appl. Phys. , vol.84 , pp. 3636
    • Huang, H.1    Gilmer, G.H.2    De La Rubia, T.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.