Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering

Surface and Coatings Technology

Volumn 191, Issue 1, 2005, Pages 17-24

  Huang, Jia Hong ^a   Lau, Kiang Wee ^a   Yu, Ge Ping ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Nanocrystalline; Nitrogen flow rate; TiN; Unbalanced magnetron sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FLOW RATES; UNBALANCED MAGNETRON (UBM) SPUTTERING;

METALLIC FILMS;

FILM;

EID: 10244253937     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.07.066     Document Type: Article

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