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Volumn 105, Issue , 2005, Pages 447-452
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Biaxially aligned yttria stabilized zirconia and titanium nitride layers deposited by unbalanced magnetron sputtering
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Author keywords
Biaxial alignment; Magnetron sputtering; Microstructure; Preferential orientation; Thin film
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Indexed keywords
MAGNETRON SPUTTERING;
MICROSTRUCTURE;
POLYCRYSTALLINE MATERIALS;
SCANNING ELECTRON MICROSCOPY;
SPUTTER DEPOSITION;
STAINLESS STEEL;
TITANIUM NITRIDE;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
YTTRIUM;
ZIRCONIA;
BIAXIAL ALIGNMENT;
PREFERENTIAL ORIENTATION;
SELECTIVE AREA DIFFRACTION (SAD);
YTTRIA STABILIZED ZIRCONIA (YSZ);
THIN FILMS;
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EID: 19444375302
PISSN: 10120394
EISSN: None
Source Type: Book Series
DOI: 10.4028/www.scientific.net/ssp.105.447 Document Type: Conference Paper |
Times cited : (12)
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References (10)
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