Theoretical and experimental determination of the energy flux during magnetron sputter deposition onto an unbiased substrate

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 2, 2003, Pages 476-483

  Ekpe, Samuel D ^a   Dew, Steven K ^a  

^a UNIVERSITY OF ALBERTA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMS; COPPER; IONIZATION; KINETIC ENERGY; SPUTTER DEPOSITION; SUBSTRATES;

ENERGY FLUX;

MAGNETRON SPUTTERING;

EID: 0037348203     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1554971     Document Type: Article

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