Interdependence between stress, preferred orientation, and surface morphology of nanocrystalline TiN thin films deposited by dual ion beam sputtering

Journal of Applied Physics

Volumn 99, Issue 11, 2006, Pages

  Abadias, G ^a   Tse, Y Y ^a   Guerin Ph ^a   Pelosin, V ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ION BEAMS; MORPHOLOGY; NANOSTRUCTURED MATERIALS; RESIDUAL STRESSES; TITANIUM NITRIDE; VOLTAGE CONTROL;

ION BEAM SPUTTERING; SUBSTRATE TEMPERATURE; SURFACE DIFFUSIVITIES; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 33745293437     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2197287     Document Type: Article

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