Influence of the Ar/N2 ratio on the preferred orientation and optical reflectance of reactively sputter deposited titanium nitride thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 1, 2003, Pages 310-317

  Banerjee, R ^a   Singh, K ^b   Ayyub, P ^c   Totlani, M K ^b   Suri, A K ^b  

^a OHIO STATE UNIVERSITY   (United States)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

^c TATA INSTITUTE OF FUNDAMENTAL RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; MAGNETRON SPUTTERING; MICROSTRUCTURE; MOLECULAR ORIENTATION; MORPHOLOGY; NITROGEN; REFLECTION; SPUTTER DEPOSITION; STAINLESS STEEL; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRON TRANSPARENCY; FRANK-VAN DER MERWE TYPE; GROWTH MORPHOLOGIES; OPTICAL REFLECTANCE; REACTIVE DIRECT CURRENT MAGNETRON SPUTTERING;

TITANIUM NITRIDE;

EID: 0037276578     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1531132     Document Type: Article

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