RF amplified magnetron source for efficient titanium nitride deposition

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 100-106

  Konstantinidis, S ^a   Nouvellon, C ^a   Dauchot, J P ^a   Wautelet, M ^a   Hecq, M ^a  

^a UNIVERSITY OF MONS   (Belgium)

Author keywords

Ion energy analysis; Ionized magnetron; Mass spectrometry; Titanium nitride

Indexed keywords

AMPLIFICATION; DEPOSITION; IONIZATION; THIN FILMS; TITANIUM NITRIDE;

MAGNETRON PLASMA;

MAGNETRONS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0041355507     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00528-0     Document Type: Article

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