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Volumn 279, Issue 1-2, 2005, Pages 100-109

Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers

Author keywords

A1. Growth models; A3. Physical vapour deposition; B1. Nitrides; B1. Oxides

Indexed keywords

CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; MAGNETRON SPUTTERING; NITRIDES; OXIDES; PHYSICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; STAINLESS STEEL; TITANIUM NITRIDE; YTTRIUM COMPOUNDS; ZIRCONIA;

EID: 17744397516     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2005.02.014     Document Type: Article
Times cited : (52)

References (13)
  • 8
    • 0003495856 scopus 로고    scopus 로고
    • International Centre for Diffraction Data, ICDD, YSZ: pattern no. 00-030-1468, TiN: pattern no. 00-038-1420
    • Powder Diffraction file, International Centre for Diffraction Data, ICDD, YSZ: pattern no. 00-030-1468, TiN: pattern no. 00-038-1420.
    • Powder Diffraction File


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.