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Volumn 279, Issue 1-2, 2005, Pages 100-109
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Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers
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Author keywords
A1. Growth models; A3. Physical vapour deposition; B1. Nitrides; B1. Oxides
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Indexed keywords
CRYSTAL GROWTH;
CRYSTAL MICROSTRUCTURE;
MAGNETRON SPUTTERING;
NITRIDES;
OXIDES;
PHYSICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SPUTTER DEPOSITION;
STAINLESS STEEL;
TITANIUM NITRIDE;
YTTRIUM COMPOUNDS;
ZIRCONIA;
CRYSTAL HABIT;
GROWTH MODELS;
POLYCRYSTALLINE STAINLESS STEEL;
PREFERENTIAL ORIENTATION;
CRYSTAL ORIENTATION;
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EID: 17744397516
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.02.014 Document Type: Article |
Times cited : (52)
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References (13)
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