Mechanism of biaxial alignment in thin films, deposited by magnetron sputtering

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 416-420

  Mahieu, S ^a   Buyle, G ^a   Ghekiere, P ^a   Heirwegh, S ^a   De Gryse, R ^a   Depla, D ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Biaxial alignment; Growth model; Magnetron sputtering; Preferential orientation; Thin film structure

Indexed keywords

ANISOTROPY; FLUXES; GRAIN GROWTH; MATHEMATICAL MODELS; MONTE CARLO METHODS; THIN FILMS; TITANIUM NITRIDE;

BIAXIAL ALIGNMENT; GROWTH MODELS; PREFERENTIAL ORIENTATION; THIN FILM STRUCTURES;

MAGNETRON SPUTTERING;

EID: 33748750609     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.226     Document Type: Article

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