Three-dimensional Monte Carlo simulation of sputtered atom transport in the process of ion-plasma sputter deposition of multicomponent thin films

Vacuum

Volumn 52, Issue 4, 1999, Pages 427-434

  Petrov, P K ^a   Volpyas, V A ^a   Chakalov, R A ^b  

^a SAINT PETERSBURG ELECTROTECHNICAL UNIVERSITY LETI   (Russian Federation)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; COMPUTER SIMULATION; COPPER; MONTE CARLO METHODS; OXIDE SUPERCONDUCTORS; SUPERCONDUCTING FILMS;

ATOM TRANSPORT; ION PLASMA SPUTTER DEPOSITION;

MAGNETRON SPUTTERING;

EID: 0033114872     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(98)00326-1     Document Type: Article

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