Atomic force microscope lithography

Nanofabrication: Fundamentals and Applications

Volumn , Issue , 2008, Pages 33-64

  Kawasegi, Noritaka ^a   Lee, Deug Woo ^b   Morita, Noboru ^c   Park, Jeong Woo ^b  

^a TOYAMA INDUSTRIAL TECHNOLOGY CENTER   (Japan)

^b Pusan National University   (South Korea)

^c UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Alkyl Monolayer; Aspect Ratio; ; Atomic Force Microscope (AFM); Cantilever; Cantilever Array; Carbon Nanotube (CNT); Data Strange Device; Diamond; Dip Pen Nanolithography (DPN); Electric Field; Electron Beam (EB); Etching; Feedback; Focused Ion Beam (FIB); Full Width at Half Maximum (FWHM); Isopropyl Alcohol (IPA); Material Transfer; Mechanical Lithography; Millipede; Nano Stage; Nanolithography; Octadecyltrichrolosilane (OTS); Oxidation; Photolithography; Poly methylmethacrylate (PMMA); Reactive Ion Etching (RIE); Relative Humidity; Scanning Electron Microscopy (SEM); Scanning Near Field Optical Microscope (SNOM); Scanning Probe Microscope (SPM); Scanning Tunneling Microscope (STM); Self Assembled Monolayer (SAM); Tetra Methyl Ammonium Hydroxide (TMAH); Tip Wear; Tribo Nanolithography (TNL); Ultra High Vacuum (UHV)

Indexed keywords

AMMONIUM HYDROXIDE; ANISOTROPIC ETCHING; ASPECT RATIO; ATMOSPHERIC HUMIDITY; CARBON; CARBON NANOTUBES; DIAMONDS; ELECTRIC FIELDS; ELECTROCHEMICAL OXIDATION; ETCHING; FEEDBACK; FOCUSED ION BEAMS; FULL WIDTH AT HALF MAXIMUM; ION BEAMS; LITHOGRAPHY; MICROSCOPES; MONOLAYERS; NANOCANTILEVERS; NANOLITHOGRAPHY; NANOTECHNOLOGY; NEAR FIELD SCANNING OPTICAL MICROSCOPY; OXIDATION; PHOTOLITHOGRAPHY; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SELF ASSEMBLED MONOLAYERS; SURFACE TOPOGRAPHY; ULTRAHIGH VACUUM; YARN;

ALKYL MONOLAYERS; CANTILEVER; CANTILEVER ARRAYS; DATA STRANGE DEVICE; DIP-PEN NANOLITHOGRAPHY; ISOPROPYL ALCOHOLS; MATERIAL TRANSFERS; MECHANICAL LITHOGRAPHY; METHYL METHACRYLATES; MILLIPEDE; NANO-STAGE; OCTADECYLTRICHROLOSILANE (OTS); TETRAMETHYL AMMONIUM HYDROXIDE; TIP WEAR; TRIBO NANOLITHOGRAPHIES;

ATOMIC FORCE MICROSCOPY;

EID: 84986586509     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1017/9789812790897_0002     Document Type: Chapter

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