Writing fib implantation and subsequent anisotropic wet chemical etching for fabrication of 3d structures in silicon

Sensors and Actuators, A: Physical

Volumn 61, Issue 1-3, 1997, Pages 369-373

  Schmidt, B ^a   Bischoff, L ^a   Teichert, J ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Innovative processing methods; Micromachining

Indexed keywords

ETCHING; ION BEAMS; ION IMPLANTATION; MICROELECTRONICS; MICROMACHINING; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR DOPING;

FOCUSED ION BEAM (FIB); INNOVATIVE PROCESSING METHODS;

SEMICONDUCTING SILICON;

EID: 0031169179     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)80291-9     Document Type: Article

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