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Volumn 296, Issue 5574, 2002, Pages 1836-1838
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Direct patterning of modified oligonucleotides on metals and insulators by dip-pen nanolithography
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL BONDS;
CHEMICAL MODIFICATION;
FEATURE EXTRACTION;
GOLD;
METAL INSULATOR TRANSITION;
NANOTECHNOLOGY;
FEATURE SIZES;
DNA SEQUENCES;
ACRYLAMIDE;
DNA;
GALLIUM ARSENIDE;
GOLD;
INK;
METAL;
OLIGONUCLEOTIDE;
SILANE DERIVATIVE;
SILICON DIOXIDE;
SILICON NITRIDE;
THIOL DERIVATIVE;
DNA;
METAL;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
DNA SEQUENCE;
HYBRIDIZATION;
NANOLITHOGRAPHY;
PRIORITY JOURNAL;
TECHNIQUE;
ADSORPTION;
DNA;
GOLD;
HUMIDITY;
MICROSCOPY, ATOMIC FORCE;
NANOTECHNOLOGY;
NUCLEIC ACID HYBRIDIZATION;
OLIGODEOXYRIBONUCLEOTIDES;
OLIGONUCLEOTIDE ARRAY SEQUENCE ANALYSIS;
OXIDES;
SILANES;
SILICON COMPOUNDS;
SULFHYDRYL COMPOUNDS;
SURFACE PROPERTIES;
TEMPERATURE;
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EID: 0037036108
PISSN: 00368075
EISSN: None
Source Type: Journal
DOI: 10.1126/science.1071480 Document Type: Article |
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Times cited : (673)
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References (26)
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