Fabrication of silicon and metal nanowires and dots using mechanical atomic force lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 5, 1998, Pages 2822-2824

  Hu, S ^a   Hamidi, A ^a   Altmeyer, S ^a   Koster T ^a   Spangenberg, B ^a   Kurz, H ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; POLYMETHYL METHACRYLATES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; TITANIUM; ULTRATHIN FILMS;

BILAYER RESIST SYSTEM; MECHANICAL ATOMIC FORCE LITHOGRAPHY; METAL NANOWIRES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032159759     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590277     Document Type: Article

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