Surface modification of niobium (Nb) by atomic force microscope (AFM) nano-oxidation process

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 11 SUPPL. B, 1996, Pages

  Shirakashi, Jun Ichi ^a   Ishii, Masami ^a   Matsumoto, Kazuhiko ^a   Miura, Naruhisa ^b   Konaga, Makoto ^b  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b Tokyo Institute of Technology ^*  (Japan)

Author keywords

Anodization; Atomic force microscope (AFM); Nb oxide; Niobium (Nb); Single electron transistor (SET); Surface modification

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CRYSTAL STRUCTURE; NANOTECHNOLOGY; NIOBIUM; OXIDATION; SPUTTER DEPOSITION; SURFACE TREATMENT; THIN FILMS; TRANSISTORS;

METAL COATED CONDUCTIVE CANTILEVER; NEGATIVE BIAS VOLTAGES; NIOBIUM THIN FILMS; SINGLE ELECTRON TRANSISTORS;

METALLIC FILMS;

EID: 0030284233     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1524     Document Type: Article

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