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Volumn 76, Issue 3, 2000, Pages 360-362

Nanometer-scale conversion of Si3N4 to SiOx

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000009941     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125754     Document Type: Article
Times cited : (84)

References (14)
  • 1
    • 0004005306 scopus 로고
    • Wiley, New York
    • nd ed. (Wiley, New York, 1981), p. 852.
    • (1981) nd Ed. , pp. 852
    • Sze, S.M.1
  • 4
    • 0042691908 scopus 로고    scopus 로고
    • edited by S. A. Campbell and H. J. Lewerenz Wiley, Chichester, Chap. 2
    • S. D. Collin, in Semiconductor Micromachining, edited by S. A. Campbell and H. J. Lewerenz (Wiley, Chichester, 1998), Vol. 2, Chap. 2.
    • (1998) Semiconductor Micromachining , vol.2
    • Collin, S.D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.