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Volumn 23, Issue 2, 1998, Pages 441-444
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SiO2 and Si nanoscale patterning with an atomic force microscope
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Author keywords
Atomic force microscope; Nanolithographic
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
COMPUTER SOFTWARE;
ETCHING;
HEAT TRANSFER;
PHOTORESISTS;
POTASSIUM COMPOUNDS;
SEMICONDUCTOR SWITCHES;
SILICA;
SILICON WAFERS;
SUBSTRATES;
NANOLITHOGRAPHY;
NANOSCALE PATTERNING;
WET CHEMICAL ETCHING;
NANOTECHNOLOGY;
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EID: 0031701484
PISSN: 07496036
EISSN: None
Source Type: Journal
DOI: 10.1006/spmi.1996.0358 Document Type: Article |
Times cited : (15)
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References (7)
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