SiO2 and Si nanoscale patterning with an atomic force microscope

Superlattices and Microstructures

Volumn 23, Issue 2, 1998, Pages 441-444

  Klehn, B ^a   Kunze, U ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Atomic force microscope; Nanolithographic

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SOFTWARE; ETCHING; HEAT TRANSFER; PHOTORESISTS; POTASSIUM COMPOUNDS; SEMICONDUCTOR SWITCHES; SILICA; SILICON WAFERS; SUBSTRATES;

NANOLITHOGRAPHY; NANOSCALE PATTERNING; WET CHEMICAL ETCHING;

NANOTECHNOLOGY;

EID: 0031701484     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1006/spmi.1996.0358     Document Type: Article

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