Nanostructure patterns written in III-V semiconductors by an atomic force microscope

Applied Physics Letters

Volumn 70, Issue 14, 1997, Pages 1855-1857

  Magno, R ^a   Bennett, B R ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; NANOSTRUCTURED MATERIALS; PHOTORESISTS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR QUANTUM WIRES;

ETCH MASK; IN PLANE GATED STRUCTURE; LATTICE MISMATCH;

SEMICONDUCTOR MATERIALS;

EID: 0031557558     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118712     Document Type: Article

References (15)

1. M. Wendel, S. Kühn, H. Lorenz, J. P. Kotthaus, and M. Holland, Appl. Phys. Lett, 65, 1775 (1994).
2. L. L. Sohn and R. L. Willett, Appl. Phys. Lett. 67, 1552 (1995).
3. M. J. Lercel, G. F. Redinbo, H. G. Craighead, C. W. Sheen, and D. L. Allara, Appl. Phys. Lett. 65, 974 (1994).
4. J. A. Dagata, W. Tseng, J. Bennett, J. Schneir, and H. H. Harary, J. Appl. Phys. 70, 3661 (1991).
5. J. A. Dagata, W. Tseng, J. Bennett, E. A Dobisz, H. Schneir, and H. H. Harary, J. Vac. Sci. Technol. A 10, 2105 (1992).
6. Two reviews of proximal probe lithography are Technology of Proximal Probe Lithography, edited by C. R. K. Marrian (SPIE, Bellingham, 1993) and R. Wiesendanger, Scanning Probe Microscopy and Spectroscopy: Methods and Applications (Cambridge University Press, Cambridge, 1994).
7. Two reviews of proximal probe lithography are Technology of Proximal Probe Lithography, edited by C. R. K. Marrian (SPIE, Bellingham, 1993) and R. Wiesendanger, Scanning Probe Microscopy and Spectroscopy: Methods and Applications (Cambridge University Press, Cambridge, 1994).
8. A. D. Wieck and K. Ploog, Appl. Phys. Lett. 56, 928 (1990).
9. A. Majumdar, P. I. Oden, J. P. Carrejo, L. A. Nagahara, J. J. Graham, and J. Alexander, Appl. Phys. Lett. 61, 2293 (1992).
10. T. A. Jung, A. Moser, J. J. Hug, D. Brodbeck, R. Hofer, H. R. Hidber, and U. D. Schwartz, Ultramicroscopy 42-44, 1446 (1992).
11. Sidney R. Cohen, Ultramicroscopy 42-44, 66 (1992).
12. T. Thundat, X.-Y. Zheng, G. Y. Chen, and R. J. Warmack, Surf. Sci. Lett. 294, L939 (1993).
13. B. Brar and D. Leonard, Appl. Phys. Lett. 66, 463 (1995).
14. P. M. Thibado, B. R. Bennett, M. E. Twigg, B. V. Shanabrook, and L. J. Whitman, J. Vac. Sci. Technol. A 14, 885 (1996).
15. G. C. DeSalvo, R. Kaspi, and C. A. Bozada, J. Electrochem. Soc. 141, 3526 (1994).