Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope

Applied Physics Letters

Volumn 80, Issue 14, 2002, Pages 2565-2567

  Ara, Masato ^a   Graaf, Harald ^b   Tada, Hirokazu ^b  

^a GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

1-ALKENES; AFM LITHOGRAPHY; ALKYL MONOLAYERS; AMBIENT CONDITIONS; ANODIZATIONS; ATOMIC FORCE MICROSCOPES; CHEMICAL ETCHING; COVALENTLY BOUND; HIGH RESISTANCE; NANO-METER SCALE; NANOPATTERNING; ORGANIC/INORGANIC INTERFACES; POSITIVE BIAS VOLTAGES; SI (1 1 1); SI SURFACES;

ATOMIC FORCE MICROSCOPY; ETCHING; HYDROGEN; MONOLAYERS; OLEFINS;

SILICON;

EID: 79956036802     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1467973     Document Type: Article

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