Atomic force microscope nanolithography on SiO2/semiconductor surfaces

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 6 SUPPL. B, 1997, Pages 4057-4060

  Avramescu, Adrian ^a   Uesugi, Katsuhiro ^a   Suemune, Ikuo ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

AFM; Nanolithography; PMMA; Selective growth mask; SiO2

Indexed keywords

EID: 0001131792     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4057     Document Type: Article

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