Noncontact nanolithography using the atomic force microscope

Applied Physics Letters

Volumn 73, Issue 17, 1998, Pages 2527-2529

  Wilder, Kathryn ^a   Quate, Calvin F ^a   Adderton, Dennis ^b   Bernstein, Robert ^b   Elings, Virgil ^b  

^a STANFORD UNIVERSITY   (United States)

^b Digital Instruments   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000534196     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122504     Document Type: Article

References (14)

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2. H. Sugimura and N. Nakagiri, Nanotechnology 8, A15 (1997).
3. M. Ishibashi, S. Heike, H. Kajiyama, Y. Wada, and T. Hashizume, Appl. Phys. Lett. 72, 1581 (1998).
4. Control of the field emission current during contact AFM scanning has also been used for characterizing thin oxide films. T. G. Ruskell, R. K. Workman, D. Chen, D. Sarid, S. Dahl, and S. Gilbert, Appl. Phys. Lett. 68, 93 (1996).
5. Local oxidation of silicon has been performed using the AFM in a noncontact mode based on the force gradient. D. Wang, L. Tsau, and K. L. Wang, Appl. Phys. Lett. 65, 1415 (1994).
6. M. A. McCord and R. F. W. Pease, J. Vac. Sci. Technol. B 6, 293 (1988).
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8. C. R. K. Marrian, E. A. Dobisz, and J. A. Dagata, J. Vac. Sci. Technol. B 10, 2877 (1992).
9. Moreland and Rice used a macroscopic force sensor on an STM to perform magnetic recording and imaging in a noncontact mode. J. Moreland and P. Rice, Appl. Phys. Lett. 57, 310 (1990).
10. M. A. McCord, Ph.D. thesis, Stanford University, 1987.
11. B. R. Chalamala, Y. Wei, and B. E. Gnade, IEEE Spectr. 35, 50 (1998).
12. S. C. Minne, Ph.D. thesis, Stanford University, 1996.
13. K. Wilder, C. F. Quate, B. Singh, and D. F. Kyser, J. Vac. Sci. Technol. B (to be published).
14. S. C. Minne, G. Yaralioglu, S. R. Manalis, J. D. Adams, J. Zesch, A. Atalar, and C. F. Quate, Appl. Phys. Lett. 72, 2340 (1998).