Scanning probe lithography for electrode surface modification

Journal of Electroanalytical Chemistry

Volumn 473, Issue 1, 1999, Pages 230-234

  Sugimura, Hiroyuki ^a   Takai, Osamu ^a   Nakagiri, Nakagiri ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ETCHING; GOLD; HYDROGEN PEROXIDE; LITHOGRAPHY; MONOLAYERS; NANOTECHNOLOGY; SILANES; SURFACE TREATMENT;

SCANNING PROBE LITHOGRAPHY; SCANNING PROBE MICROSCOPY (SPM);

ELECTROCHEMICAL ELECTRODES;

EID: 0033321813     PISSN: 00220728     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(99)00062-5     Document Type: Article

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