Three-dimensional nanofabrication with 10-nm resolution

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 43, Issue 8 B, 2004, Pages

  Yamazaki, Kenji ^a   Yamaguchi, Toru ^a   Namatsu, Hideo ^a  

^a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories   (Japan)

Author keywords

Depth of focus; Electron beam lithography; Nano globe; Three dimensional nanofabrication

Indexed keywords

ALCOHOLS; ELECTRON BEAM LITHOGRAPHY; MOLECULAR DYNAMICS; OPTIMIZATION; POLYMETHYL METHACRYLATES; SYNCHROTRONS;

DEPTH OF FOCUS; NANO-GLOBE; THREE-DIMENSIONAL NANOFABRICATION; X RAY BEAMS;

NANOTECHNOLOGY;

EID: 6344243408     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.L1111     Document Type: Article

References (8)

1. S. Kawata, H. Sun, T. Tanaka and K. Takeda: Nature 412 (2001) 697.
2. F. Romanato et al: Microelecron. Eng. 67-68 (2003) 479.
3. H. Sato, T. Kakimura, J. S. Go and S. Snoji: Proc. 16th Int. Cont. MEMS (IEEE, Piscataway, NJ, 2003) p. 223.
4. K. Yamazaki and H. Namatsu: Jpn. J. Appl. Phys. 43 (2004) 3767.
5. K. Yamazaki and H. Namatsu: Microelectron. Eng. 73-74 (2004) 85.
6. K. Yamazaki and H. Namatsu: Proc. 17th Int. Cont. MEMS (IEEE, Piscataway, NJ, 2004) p. 609.
7. K. Yamazaki et al: in preparation for publication.
8. K. Kurihara, K. Iwadate, H. Namatsu, M. Nagase, H. Takenaka and K. Murase: Jpn. J. Appl. Phys. 34 (1995) 6940.