AFM lithography of aluminum for fabrication of nanomechanical systems

Ultramicroscopy

Volumn 97, Issue 1-4, 2003, Pages 467-472

  Davis, Z J ^a   Abadal, G ^b   Hansen, O ^a   Borise X ^b   Barniol, N ^b   Perez Murano F ^b,c   Boisen, A ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^c INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

Author keywords

AFM lithography; Non contact AFM

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CMOS INTEGRATED CIRCUITS; DRY ETCHING; NANOSTRUCTURED MATERIALS; WEAR OF MATERIALS;

NANOMECHANICAL DEVICES;

NANOTECHNOLOGY;

ALUMINUM; ALUMINUM OXIDE;

ANALYTIC METHOD; ANALYTICAL PARAMETERS; ARTICLE; ATOMIC FORCE MICROSCOPY; LITHOGRAPHY; MOLECULAR INTERACTION; NANOTECHNOLOGY; OXIDATION;

EID: 0038541960     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(03)00075-5     Document Type: Article

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