Understanding scanned probe oxidation of silicon

Applied Physics Letters

Volumn 73, Issue 2, 1998, Pages 271-273

  Dagata, J A ^a   Inoue, T ^b   Itoh, J ^b   Yokoyama, H ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001184618     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121777     Document Type: Article

References (24)

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14. Certain commercial equipment, instruments, or materials are identified in this paper in order to adequately specify the experimental procedure. Such identification does not imply recommendation or endorsement by NIST, nor does it imply that the materials or equipment identified are necessarily the best available for the purpose.
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24. Modulation enhancement has been confirmed recently by another research group: F. Perez-Murano (private communication).