Electron beam lithography in nanoscale fabrication: Recent development

IEEE Transactions on Electronics Packaging Manufacturing

Volumn 26, Issue 2, 2003, Pages 141-149

  Tseng, Ampere A ^a   Chen, Kuan ^b   Chen, Chii D ^c   Ma, Kung J ^d  

^a Arizona State University   (United States)

^b UNIVERSITY OF UTAH   (United States)

^c INSTITUTE OF PHYSICS   (Taiwan)

^d CHUNG HUA UNIVERSITY   (Taiwan)

Author keywords

Direct writing; e Beam resist; Electron beam lithography; Nanodevices; Nanofabrication; Nanotechnology; Projection printing

Indexed keywords

MICROELECTRONIC PROCESSING; NANOTECHNOLOGY; PHOTOLITHOGRAPHY; PHOTORESISTS; PRINTED CIRCUIT DESIGN;

ELECTRON BEAM RESIST; NANOSCALE FABRICATION; PROJECTION PRINTING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0242302428     PISSN: 1521334X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TEPM.2003.817714     Document Type: Article

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