Alkylation of Si surfaces using a two-step halogenation/Grignard route

Journal of the American Chemical Society

Volumn 118, Issue 30, 1996, Pages 7225-7226

  Bansal, Ashish ^a   Li, Xiuling ^a   Lauermann, Iver ^a   Lewis, Nathan S ^a   Yi, Sang I ^b   Weinberg, W H ^b  

^a California Institute of Technology ^*  (United States)

^b University of California at Santa Barbara   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYLATION; ARTICLE; ELECTRODE; REACTION ANALYSIS; SURFACE PROPERTY;

EID: 0029780707     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja960348n     Document Type: Article

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