Chemically active plasmas for surface passivation of Si photovoltaics

Catalysis Today

Volumn 252, Issue , 2015, Pages 201-210

  Xiao, S Q ^a,b   Xu, S ^b   Gu, X F ^a   Song, D Y ^c   Zhou, H P ^b,d   Ostrikov, K ^e,f,g  

^a JIANGNAN UNIVERSITY   (China)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^c Yingli Green Energy ^*  (China)

^d UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^e CSIRO   (Australia)

^f UNIVERSITY OF SYDNEY   (Australia)

^g QUEENSLAND UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

Reactive plasma; Si photovoltaics; Surface passivation

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; AMORPHOUS FILMS; DEPOSITION; DIELECTRIC FILMS; HYDROGENATION; OXIDE FILMS; PASSIVATION; SILICON NITRIDE; SILICON OXIDES; SOLAR CELLS;

A-SIOX:H; PHOTOVOLTAICS; PLASMA PROCESS; REACTIVE PLASMAS; SI-BASED SOLAR CELLS; SURFACE PASSIVATION;

AMORPHOUS SILICON;

EID: 84930046497     PISSN: 09205861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cattod.2015.03.007     Document Type: Review

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