Effective surface passivation of crystalline silicon by rf sputtered aluminum oxide

Physica Status Solidi - Rapid Research Letters

Volumn 3, Issue 5, 2009, Pages 160-162

  Li, Tsu Tsung ^a   Cuevas, Andres ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; CRYSTALLINE SILICONS; DEPOSITION METHODS; HIGH-EFFICIENCY SOLAR CELLS; LARGE-SCALE MANUFACTURING; N TYPE SILICON; P-TYPE; RADIO FREQUENCY MAGNETRON SPUTTERING; SURFACE PASSIVATION;

ALUMINA; ALUMINUM; DESCALING; PASSIVATION; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CELLS;

SILICON WAFERS;

EID: 70350217133     PISSN: 18626254     EISSN: 18626270     Source Type: Journal    
DOI: 10.1002/pssr.200903140     Document Type: Article

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