Infrared absorption and hydrogen effusion of hydrogenated amorphous silicon-oxide films

Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 845-849

  Beyer, W ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001206505     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00853-4     Document Type: Article

References (15)

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