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Volumn 21, Issue 5, 2003, Pages 2123-2132

Influence of the high-temperature "firing" step on high-rate plasma deposited silicon nitride films used as bulk passivating antireflection coatings on silicon solar cells

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; COMPOSITION EFFECTS; DENSITY (SPECIFIC GRAVITY); ELLIPSOMETRY; FIRING (OF MATERIALS); FOURIER TRANSFORM INFRARED SPECTROSCOPY; HIGH TEMPERATURE EFFECTS; OPTICAL PROPERTIES; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON SOLAR CELLS; THERMODYNAMIC STABILITY;

EID: 0242497608     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1609481     Document Type: Article
Times cited : (105)

References (50)
  • 1
    • 0242523740 scopus 로고
    • Silicon nitride for microelectronic applications, Part 2: Applications and devices
    • (IFI/Plenum, New York)
    • J. T. Milek. Silicon Nitride for Microelectronic Applications, Part 2: Applications and Devices, Handbook of Electronic Materials (IFI/Plenum, New York, 1972), Vol. 6.
    • (1972) Handbook of Electronic Materials , vol.6
    • Milek, J.T.1
  • 13
    • 0036530806 scopus 로고    scopus 로고
    • J. Non-Cryst. Solids 299-302, 1157 (2002).
    • (2002) J. Non-Cryst. Solids , vol.299-302 , pp. 1157
  • 50
    • 0242523742 scopus 로고    scopus 로고
    • private communication
    • M. Bijker, private communication (2002).
    • (2002)
    • Bijker, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.