High-rate silicon nitride deposition for photovoltaics: From fundamentals to industrial application

High Temperature Material Processes

Volumn 9, Issue 1, 2005, Pages 141-158

  Kessels, W M M ^a   Van Den Oever, P J ^a   Bosch, R C M ^b   Bijker, M D ^b   Evers, M ^b   Schram, D C ^a   Van De Sanden, M C M ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b OTB Engineering BV   (Netherlands)

Author keywords

Antireflection coating; Crystalline silicon; Passivation; Silicon nitride; Solar cells

Indexed keywords

ANTIREFLECTION COATINGS; CRYSTALLINE MATERIALS; DEPOSITION; FILM GROWTH; PASSIVATION; PHOTOVOLTAIC EFFECTS; PLASMAS; SILICON COMPOUNDS; SOLAR CELLS;

CRYSTALLINE SILICON; DEPOSITION SYSTEM; PLASMA CHEMISTRY; PLASMA TECHNIQUE;

SILICON NITRIDE;

EID: 20044374065     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v9.i1.120     Document Type: Article

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