An assessment of the process capabilities of nanoimprint lithography

Journal of Physics D: Applied Physics

Volumn 41, Issue 17, 2008, Pages

  Balla, Tobias ^a   Spearing, S Mark ^a   Monk, Andrew ^b  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^b Innos Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749087114     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/17/174001     Document Type: Article

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