Choice of the molecular weight of an imprint polymer for hot embossing lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 625-632

  Schulz, H ^a   Wissen, M ^a   Bogdanski, N ^a   Scheer, H C ^a   Mattes, K ^b   Friedrich, Ch ^b  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Commercial polymers; Hot embossing; Nanoimprint; Recovery; Shear rate effects

Indexed keywords

CHARACTERIZATION; COOLING; DATA REDUCTION; GEL PERMEATION CHROMATOGRAPHY; GLASS TRANSITION; HEATING; LITHOGRAPHY; MOLECULAR WEIGHT DISTRIBUTION; NANOTECHNOLOGY; NATURAL FREQUENCIES; RECOVERY; RHEOLOGY; THERMOMECHANICAL TREATMENT; VISCOSITY;

COMMERCIAL POLYMERS; HOT EMBOSSING; HOT EMBOSSING LITHOGRAPHY; NANOIMPRINT; NANOIMPRINT LITHOGRAPHY; POLYMER CHAINS; SHEAR RATE EFFECTS;

POLYSTYRENES;

EID: 14944343803     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.079     Document Type: Conference Paper

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