Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 314-318

  Ahn, Seh Won ^a   Lee, Ki Dong ^a   Kim, Jin Sung ^a   Kim, Sang Hoon ^a   Lee, Sarng H ^a   Park, Joo Do ^a   Yoon, Phil Won ^a  

^a LG Electronics Inc   (South Korea)

Author keywords

Nanofabrication; Nanoimprint lithography; Nanopatterning

Indexed keywords

COST EFFECTIVENESS; DRY ETCHING; ELECTRIC WIRE; LASER BEAMS; MASKS; OPTICAL BEAM SPLITTERS; OPTICAL DEVICES; OPTIMIZATION; PHOTORESISTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SILICON WAFERS;

ETCH SELECTIVITY; NANOIMPRINT LITHOGRAPHY; NANOPATTERNING; PATTERN DEFORMATION;

NANOTECHNOLOGY;

EID: 14944383747     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.040     Document Type: Conference Paper

References (6)

1. Z. Yu, W. Wu, L. Chen, and S.Y. Chou J. Vac. Sci. Technol. B 19 2001 2816
2. B. Schnabel, E. Kley, and F. Wyrowski Opt. Eng. 38 1999 220
3. S.Y. Chou, P.R. Krauss, and P.J. Renstrom Appl. Phys. Lett. 67 1995 3114
4. Z. Yu, P. Deshpande, W. Wu, J. Wang, and S.Y. Chou Appl. Phys. Lett. 77 2000 927
5. A. Lebib Microelectron. Eng. 61-62 2002 371
6. P. Carlberg Microelectron. Eng. 67-68 2003 203